MINI Sputter Coater
Metals that can be deposited: Au, Pt and Pd
  1. Magnetron sputtering cathode technology: fine deposition without thermal damage
  2. Touch screen automatic control: convenient and time-saving to use
  3. Digital rotary-tilting sample stage: 3D sample deposition

 
J20 Dual-Target Sputter Coater
Metals that can be deposited: Au, Pt and Pd. An alloy of arbitrary composition: Pt-Au, Pt-Pd, etc.
  1. Dual-Target Magnetron Sputtering: Patented Pt-Au Layered Recipe
  2. SUV in Ion Sputter Coaters: Universal Sample Compatibility
  3. Tilted Target & Rotary Stage: Optimized for 3D Microstructures

 
S20 HV Dual-Target Ion Sputter Coater
Metals that can be deposited: Au, Pt, Pd, Pt-Au layered alloy, etc.
  1. Dual-Target Magnetron Sputtering: Patented Pt-Au Layered Recipe
  2. Oil-Free High Vacuum Pump Unit: Clean & Hydrocarbon-Free
  3. Tilted Target & Rotary Stage: Optimized for 3D Microstructures


SPC150 HV Plasma Cleaner
ICP-RF remote cleaning technology: gentler plasma
  1. Ultrathin carbon film hydrocarbon contamination cleaning
  2. TEM sample/sample holder plasma treatment
  3. Specialized silicon contamination cleaning


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