The versatile, high - quality, all plastic POLOS single substrate spin coaters are specifically designed for R&D and low volume production in the MEMS, Semiconductor, PV, Microfluidics field, etc. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching.

The SPIN150i is an affordable spin coater that is suitable for processing fragments as small as 5 mm up to substrates sizes up to Ø150 (or 6”) or 4" x 4". Detachable controller interface for easy integration. Unlimited Program Storage for recipes with multiple steps each. (CW & CCW rotation, puddling.)

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